Projects
Projects: Projects for Investigator |
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| Reference Number | EP/L02201X/1 | |
| Title | Manufacturing with Light - photochemical ALD to manufacture functional thin films | |
| Status | Completed | |
| Energy Categories | Renewable Energy Sources(Solar Energy, Photovoltaics) 10%; Not Energy Related 90%; |
|
| Research Types | Basic and strategic applied research 100% | |
| Science and Technology Fields | PHYSICAL SCIENCES AND MATHEMATICS (Physics) 20%; PHYSICAL SCIENCES AND MATHEMATICS (Metallurgy and Materials) 50%; ENGINEERING AND TECHNOLOGY (Mechanical, Aeronautical and Manufacturing Engineering) 30%; |
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| UKERC Cross Cutting Characterisation | Not Cross-cutting 100% | |
| Principal Investigator |
Professor PR Chalker No email address given Centre for Materials and Structures University of Liverpool |
|
| Award Type | Standard | |
| Funding Source | EPSRC | |
| Start Date | 01 March 2014 | |
| End Date | 31 August 2015 | |
| Duration | 18 months | |
| Total Grant Value | £200,463 | |
| Industrial Sectors | Electronics | |
| Region | North West | |
| Programme | Manufacturing : Manufacturing | |
| Investigators | Principal Investigator | Professor PR Chalker , Centre for Materials and Structures, University of Liverpool (99.998%) |
| Other Investigator | Dr CJ Sutcliffe , Centre for Materials and Structures, University of Liverpool (0.001%) Dr RJ Potter , Centre for Materials and Structures, University of Liverpool (0.001%) |
|
| Industrial Collaborator | Project Contact , SAFC Hitech (0.000%) |
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| Web Site | ||
| Objectives | ||
| Abstract | The purpose of this project is to develop a novel photochemical ALD manufacturing technology. Conventional atomic layer deposition is already widely used in the displays and microelectronics industries. It is a thermo-chemical process where two precursor reagents are pulsed in cycles onto a heated work piece. The combination of the substrate temperature and the chemical reaction energy drive the process forward to deposit the thin film layer by layer. Because the process occurs on the surface, highly uniform and conformal layers can be deposited onto high-aspect ratio or porous materials with ultra-precise thickness control. In this project, we propose to develop a UV photochemical ALD process. The purpose of this is to reduce the dependence of the process on thermal energy. We will use an existing ALD reactor at Liverpool and incorporate into it a switchable UV lamp source. This will be configured so that it can expose the separate gas-phase precursors or on the surface as adsorbates. The wavelength of the output will be tuned to photo-chemically decompose the precursors to form the film. In the second stage of the project we will investigate selective deposition or 'writing' of ALD films. We'll do this using a near field approach with a lithographic plate and secondly by incorporating a TI DLP chip into the optical train just above the work piece. Both of these approaches will enable us to expose adsorbates on the surface selectively and explore the prospect of patterning ALD films. If successful, the project establish the feasibility of a new process technology to extend ALD the other industry sectors, such as roll-to-roll barrier layers; plastic electronics; organic - inorganic PV; biomedical instruments and others. | |
| Publications | (none) |
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| Final Report | (none) |
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| Added to Database | 11/04/14 | |
